The continuous progress of semiconductor process process and the continuous improvement of accuracy are not only the excellence of process equipment, but also the monitoring and control of gaseous molecular pollutants (AMC) in the clean room. Any pollutants floating in the air deposited on the wafer surface affects the process to reduce the yield. Due to the many complex steps of the process, the PPT pollutants will affect the wafer yield to a large extent.
In the face of the increasingly advanced process, AMC monitoring technology is also constantly upgraded. The new generation of AMC online monitoring system, internal and external pollution sources real-time monitoring, high sensitivity and concentration alarm mechanism, can timely feedback to the factory end, so as to control the release of pollutants, ensure the rate of good products.
Gaseous molecular pollutants (Airborne molecular contaminant, AMC) include: acids (MA), alkali (MB), condensable substances (MC) and dopants (MD). With the smaller process size, increasing process complexity and steps, the number and category of AMC in clean rooms will continue to increase. A whole set of system with high sensitivity, fast monitoring rate and more monitoring points is essential.
Ruihua Technology will be committed to the continuous improvement of AMC online monitoring system. In the process of manufacturing process, Ruihua Technology continues to cultivate deep cultivation, and will soon develop the process attached to AMC monitoring and cleaning equipment, which will greatly reduce the process pollution, improve the rate of good products.
